O'Dwyer, C.,Gay, G.,Lesegno, B. Viaris de,Weiner, J.,Mutzel, M.,Haubrich, D.,Meschede, D.,Ludolph, K.,Georgiev, G.,Oesterschulze, E.

2005

January

Journal of Physics: Conference Series

Advancing Atomic Nanolithography: Cold Atomic Cs Beam Exposure of Alkanethiol Self-Assembled Monolayers

Validated

()

19

109

117