Peer-Reviewed Journal Details
Mandatory Fields
Sonnet, A. M. and Galatage, R. V. and Hurley, P. K. and Pelucchi, E. and Thomas, K. K. and Gocalinska, A. and Huang, J. and Goel, N. and Bersuker, G. and Kirk, W. P. and Hinkle, C. L. and Wallace, R. M. and Vogel, E. M.
Applied Physics Letters
On the calculation of effective electric field in In0.53Ga0.47As surface channel metal-oxide-semiconductor field-effect-transistors
Optional Fields
The effective electron mobility of In0.53Ga0.47As metal-oxide-semiconductor field-effect-transistors with HfO2 gate oxide was measured over a wide range of channel doping concentration. The back bias dependence of effective electron mobility was used to correctly calculate the vertical effective electric field. The effective electron mobility at moderate to high vertical effective electric field shows universal behavior independent of substrate impurity concentration. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3588255]
Grant Details