Thin films of the vanadium oxides, V(2)O(5), VO(2), VO(x)(x = 2.00-2.50) and V(6)O(13) were prepared on glass substrates by atmospheric pressure chemical vapour deposition (APCVD) of vanadium tetrachloride and water at 400-550degreesC. The specific phase deposited was found to be dependent on the substrate temperature and the reagent concentrations. The films were characterised by Raman microscopy, X-ray diffraction (XRD), Rutherford backscattering (RBS), scanning electron microscopy (SEM), energy dispersive analysis by X-rays (EDX), reflectance/transmittance and UV absorption spectroscopy. The VO(2) films show by Raman microscopy and reflectance/transmittance spectroscopy, reversible switching behaviour at 68degreesC associated with a phase change from monoclinic (MoO(2) structure) to tetragonal (TiO(2), rutile structure).Thin films of the vanadium oxides, V(2)O(5), VO(2), VO(x)(x = 2.00-2.50) and V(6)O(13) were prepared on glass substrates by atmospheric pressure chemical vapour deposition (APCVD) of vanadium tetrachloride and water at 400-550degreesC. The specific phase deposited was found to be dependent on the substrate temperature and the reagent concentrations. The films were characterised by Raman microscopy, X-ray diffraction (XRD), Rutherford backscattering (RBS), scanning electron microscopy (SEM), energy dispersive analysis by X-rays (EDX), reflectance/transmittance and UV absorption spectroscopy. The VO(2) films show by Raman microscopy and reflectance/transmittance spectroscopy, reversible switching behaviour at 68degreesC associated with a phase change from monoclinic (MoO(2) structure) to tetragonal (TiO(2), rutile structure).