Holdsworth, R. J.,Martin, P. A.,Raisbeck, D.,Pemble, M. E.

1999

September

Journal De Physique Iv

In situ monitoring of atmospheric pressure tin oxide CVD using near-infrared diode laser spectroscopy

Validated

()

9

P8P8

109

113109

In situ near-IR diode laser absorption spectroscopy is a new technique which has been used to monitor reaction species involved in the atmospheric pressure tin oxide CVD deposition reaction. The system is entirely noninvasive and provides real-time analysis. Preliminary results obtained in the CVD deposition reaction of tin oxide onto a glass substrate in a small laboratory scale reactor is described. These will illustrate how sensitive the system is to small changes in reaction conditions which can then lead to much greater control over film qualities. Additionally, the light is easily transmitted through optical fibres to the reactor region to pass directly through the quartz reactor walls.In situ near-IR diode laser absorption spectroscopy is a new technique which has been used to monitor reaction species involved in the atmospheric pressure tin oxide CVD deposition reaction. The system is entirely noninvasive and provides real-time analysis. Preliminary results obtained in the CVD deposition reaction of tin oxide onto a glass substrate in a small laboratory scale reactor is described. These will illustrate how sensitive the system is to small changes in reaction conditions which can then lead to much greater control over film qualities. Additionally, the light is easily transmitted through optical fibres to the reactor region to pass directly through the quartz reactor walls.

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