Conference Publication Details
Mandatory Fields
Conroy, M. A.; Petkov, N.; Li, H. N.; Sadler, T. C.; Zubialevich, V.; Holmes, J. D.; Parbrook, P. J.
ECS Transactions
Preparation of substrates intended for the growth of lower threading dislocation densities within nitride based UV multiple quantum wells
Optional Fields
Vol. 53(2)
Toronto, ON, Canada

In this study a variety of nano-patterning techniques were applied to III-N device fabrication. A block co-polymer/metal oxide novel surface texturing method was utilised to achieve a long ranged ordered template. Nano-sphere lithography was also applied to UV multiple quantum well (MQW) structural growth using a silica nanoparticle monolayer as the mask. The monolayer was produced by a self-assembly technique without the need for either a spin coater or Langmuir-Blodgett trough resulting in a low cost arrangement. Using these nano-sized masks allows for the production of nano-rods in a much simpler method than previously used techniques. For comparison nano-rods were made by electron beam lithography at various diameters and lengths for a comprehensive investigation of crystal defects, in particular threading dislocations (TDs).

Grant Details