Duffy, R., Curatola, G., Pawlak, B.J., Doornbos, G., Van Der Tak, K., Breimer, P., Van Berkum, J.G.M., Roozeboom, F.

2008

January

Doping fin field-effect transistor sidewalls: Impurity dose retention in silicon due to high angle incident ion implants and the impact on device performance

Validated

()

26

1

402

407

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