Wieczorek, Andreas and Djara, Vladimir and Peters, Frank H and OCallaghan, James and Thomas, Kevin and Corbett, Brian

2012

January

Journal of Vacuum Science & Technology B

Inductively coupled plasma deep etching of InP/InGaAsP in Cl< inf> 2/CH< inf> 4/H< inf> 2 based chemistries with the electrode at 20° C

Validated

()

30

5

051208

051208