Peer-Reviewed Journal Details
Mandatory Fields
Wieczorek, Andreas and Djara, Vladimir and Peters, Frank H and OCallaghan, James and Thomas, Kevin and Corbett, Brian
2012
January
Journal of Vacuum Science & Technology B
Inductively coupled plasma deep etching of InP/InGaAsP in Cl< inf> 2/CH< inf> 4/H< inf> 2 based chemistries with the electrode at 20 C
Validated
()
Optional Fields
30
5
051208
051208
Grant Details