More Journal Details
Mandatory Fields
Fang, Q. and Liaw, I. and Modreanu, M. and Hurley, P.K. and Boyd, I.W.
2005
January
Microelectronics Reliability
Post deposition UV-induced O2 annealing of HfO2 thin films
Validated
Optional Fields
45
5-6
957
960
http://www.scopus.com/inward/record.url?eid=2-s2.0-14644413558&partnerID=40&md5=2336f48355467c06361f06accd48f8ed
Grant Details