Cherkaoui, K.,Monaghan, S.,Negara, M. A.,Modreanu, M.,Hurley, P. K.,O'Connell, D.,McDonnell, S.,Hughes, G.,Wright, S.,Barklie, R. C.,Bailey, P.,Noakes, T. C. Q.

2008

September

Journal Of Applied Physicsjournal Of Applied Physics

Electrical, structural, and chemical properties of HfO(2) films formed by electron beam evaporation

Validated

()

104

66

0021-89790021-8979

://WOS:000260119300110://WOS:000260119300110