Peer-Reviewed Journal Details
Mandatory Fields
Hobbs, Richard G and Schmidt, Michael and Bolger, Ciara T and Georgiev, Yordan M and Fleming, Peter and Morris, Michael A and Petkov, Nikolay and Holmes, Justin D and Xiu, Faxian and Wang, Kang L and others
2012
January
Resist--substrate interface tailoring for generating high-density arrays of Ge and Bi2Se3 nanowires by electron beam lithography
Validated
()
Optional Fields
30
4
041602
Grant Details