Shayesteh, M,O' Connell, D,Gity, F,Murphy-Armando, P,Yu, R,Huet, K,Toque-Tresonne, I,Cristiano, F,Boninelli, S,Henrichsen, HH,Nielsen, PF,Petersen, DH,Duffy, R

2014

December

IEEE Transactions On Electron Devices

Optimized Laser Thermal Annealing on Germanium for High Dopant Activation and Low Leakage Current

Validated

WOS: 33 ()

Ge laser thermal annealing (LTA) leakage current n plus /p junction P+/N JUNCTIONS

61

4047

4055

In this paper, state-of-the-art laser thermal annealing is used to fabricate Ge diodes. We compared the effect of laser thermal annealing (LTA) and rapid thermal annealing (RTA) on dopant activation and electrical properties of phosphorus and Arsenic-doped n+/p junctions. Using LTA, high carrier concentration above 1020 cm(-3) was achieved in n-type doped regions, which enables low access resistance in Ge devices. Furthermore, the LTA process was optimized to achieve a diode I-ON/I-OFF ratio similar to 10(5) and ideality factor (n) similar to 1.2, as it allows excellent junction depth control when combined with optimized implant conditions. On the other hand, RTA revealed very high I-ON/I-OFF ratio similar to 10(7) and n similar to 1, at the cost of high dopant diffusion and lower carrier concentrations which would degrade scalability and access resistance.

10.1109/TED.2014.2364957