Peer-Reviewed Journal Details
Mandatory Fields
Kommeren, S;Sullivan, T;Bastiaansen, CWM
2016
January
RSC Advances
Tunable surface topography in fluoropolymers using photo-embossing
Validated
Optional Fields
PATTERNED ULTRAVIOLET ILLUMINATION REACTION-DIFFUSION MODEL RELIEF STRUCTURES COATINGS PHOTOPOLYMERIZATION MICROMETER STRENGTH CELLS
6
69117
69123
Novel methods that allow creation and tunable control of surface relief in polymer films are of key interest in the search for novel low surface energy materials. For example, photochemically cross-linked (UV-cured) high-performance fluoropolymer films with an engineered surface relief of precisely defined shapes and dimensions could have widespread applications. Here, we report a fabrication method based on photo-embossing that provides the ability to create surface relief in fluorinated elastomers. The height and shape of the surface relief structures can be altered as desired by changing the processing conditions such as energy dose, monomer composition and the added solvent volumes. Surface relief structures with heights of up to 9 mm have been obtained using a photomask with a 40 mm pitch. We demonstrate that surface relief structures with a broad range of shapes and dimensions can be created if appropriate photomasks are available.
CAMBRIDGE
2046-2069
10.1039/c6ra13801b
Grant Details