Mandatory Fields

Authors

Alexei N. Nazarov,Volodymyr O. Yukhymchuk,Yurii V. Gomeniuk,Sergiy B. Kryvyi,Pavel N. Okholin,Petro M. Lytvyn,Vasyl P. Kladko,Volodymyr S. Lysenko,Volodymyr I. Glotov,Illya E. Golentus,Enrico Napolitani,Ray Duffy

Year

2017

Month

Journal

Journal Of Vacuum Science & Technology B, Nanotechnology And Microelectronics: Materials, Processing, Measurement, And Phenomena

Title

Enhanced recrystallization and dopant activation of P+ ion-implanted super-thin Ge layers by RF hydrogen plasma treatment

Status

Validated

Times Cited

WOS: 3 ()

Optional Fields

Keywords

atomic force microscopy,capacitance,diffusion,elemental semiconductors,germanium,phosphorus,plasma materials processing,Raman spectra,rapid thermal annealing,recrystallisation,secondary ion mass spectra,X-ray reflection

Volume

Issue

Start Page

51203

End Page

Abstract

Publisher Location

ISBN / ISSN

Edition

URL

http://avs.scitation.org/doi/abs/10.1116/1.4996139

DOI Link

10.1116/1.4996139

Grant Details

Funding Body

Grant Details