Sonnet, AM;Galatage, RV;Hurley, PM;Pelucchi, E;Thomas, K;Gocalinska, A;Huang, J;Goel, N;Bersuker, G;Kirk, WP;Hinkle, CL;Vogel, EM

MICROELECTRONIC ENGINEERING

Remote phonon and surface roughness limited universal electron mobility of In0.53Ga0.47As surface channel MOSFETs

2011

July

Validated

1

WOS: 28 ()

FIELD-EFFECT TRANSISTOR LAYER-DEPOSITED AL2O3 MOS INVERSION-LAYERS ALLOY SCATTERING GATE OXIDE FABRICATION SYSTEMS MODEL

1083

1086

The inversion layer electron mobility in n-channel In0.53Ga0.47As MOSFET's with HfO2 gate dielectric with several substrate impurity concentrations (similar to 1 x 10(16) cm(-3) to similar to 1 x 10(18) cm(-3)) and various surface preparations (HF surface clean, (NH4)(2)S surface clean and PECVD a-Si interlayer with a HfO2 gate dielectric) have been studied. The peak electron mobility is observed to be strongly dependent on the surface preparation, but the high field mobility is observed to be almost independent of the surface preparation. A detailed analysis of the effective mobility as a function of electric field, substrate doping, and temperature was used to determine the various mobility components (surface roughness, phonon, and coulombic scattering limited mobility components). For the substrates with high doping concentration, the electron mobility at low vertical electric field is dominated by Coulomb scattering from the substrate dopants, whereas, for lower substrate doping the Coulombic scattering is dominated by the disorder induced gap states. Low temperature measurements were used to determine the surface roughness scattering and phonon components. The results show that room temperature mobility of In0.53Ga0.47As surface channel MOSFETs with HfO2 gate dielectric at high electric field is limited primarily by remote phonons whereas the Al2O3 gate dielectric is limited by surface roughness scattering. (c) 2011 Elsevier B.V. All rights reserved.

10.1016/j.mee.2011.03.120