Peer-Reviewed Journal Details
Mandatory Fields
Avino, S,Winfield, R;
2010
January
Journal of Optoelectronics and Advanced Materials
Fabrication of 2-D quasiperiodic photonic crystals using single grating phase mask lithography
Validated
()
Optional Fields
Photonic crystals Photolithography Phase masks BAND-GAPS EXPOSURE
12
770
772
We present a method for the fabrication of large area 2-D quasiperiodic photonic crystals based on phase-mask lithography. An Excimer laser is used to expose a photoresist material through a 1-dimensional grating. The grating is placed in contact with a thin film of photoresist. The near-field interference pattern generated in proximity of the grating transfers its structure into the resist. Performing multiple exposures at different orientations between the grating and the sample it is possible to obtain 2-D quasiperiodic structures. Results on 2-D structures obtained are shown and the potential application of this technique to fabricate low cost and large area 2-D phase masks for generation of 3-D quasiperiodic photonic crystals is discussed.
Grant Details