We present a method for the fabrication of large area 2-D quasiperiodic photonic crystals based on phase-mask lithography. An Excimer laser is used to expose a photoresist material through a 1-dimensional grating. The grating is placed in contact with a thin film of photoresist. The near-field interference pattern generated in proximity of the grating transfers its structure into the resist. Performing multiple exposures at different orientations between the grating and the sample it is possible to obtain 2-D quasiperiodic structures. Results on 2-D structures obtained are shown and the potential application of this technique to fabricate low cost and large area 2-D phase masks for generation of 3-D quasiperiodic photonic crystals is discussed.