Conference Publication Details
Mandatory Fields
Duffy R.;Shayesteh M.
2014 International Workshop on Junction Technology, IWJT 2014
Novel processing for access resistance reduction in Germanium devices
2014
January
Validated
1
Scopus: 2 ()
Optional Fields
155
160
This paper reviews the experimental state-of-the-art in access resistance reduction in Ge devices. Special attention is paid to the doping and thermal annealing state-of-the-art, highlighting in particular those techniques that have been applied to Si devices, but have not yet been properly optimised in Ge. We also look forward to emerging novel processes for access resistance reduction. 2014 IEEE.
10.1109/IWJT.2014.6842051
Grant Details