We have demonstrated a novel process to fabricate solution-processable TFTs with a one-step, self-aligned definition of the dimensions in all functional layers. The TFT-channel, semiconductor materials, and gate dimension of different layers are all determined by one-step imprint process and the subsequent pattern transfer without the need for multiple patterning and mask alignment. In addition, all the techniques used here, i.e., imprinting, wet/dry etching, and inkjet printing, are available in roll-to-roll processes. The demonstrated high-resolution features, mask alignment free process, and compatibility to roll-to-roll fabrication show that this technique is ready to use and has the advantage of low cost. © 2012 IEEE.